Tasin oxygen diffusion barrier in multilayer structures
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United States of America Patent
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Aug 18, 1998
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Jun 21, 1996
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Jan 12, 1995
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Abstract
A multilayer structure having an oxygen or dopant diffusion barrier fabricated of an electrically conductive, thermally stable material of refractory metal-silicon-nitrogen which is resistant to oxidation, prevents out-diffusion of dopants from silicon and has a wide process window wherein the refractory metal is selected from Ta, W, Nb, V, Ti, Zr, Hf, Cr and Mo.
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