Substrate heat treatment table apparatus
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United States of America Patent
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-
Oct 6, 1998
Grant Date -
N/A
app pub date -
Oct 25, 1995
filing date -
Oct 26, 1994
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A substrate treatment apparatus according to an aspect of the invention includes a table for placing thereon an object to be treated, heating means for heating the object with the table interposed therebetween, and a plurality of support members which project from the table for supporting the object with a space interposed between the object and the table. The height of each of the support members can be varied in accordance with a surface temperature distribution of the object during treatment. A substrate treatment apparatus according to another aspect of the invention includes a table for placing thereon an object to be treated, and heating means for heating the object with the table interposed therebetween. The table has a surface thereof divided into regions of different heat radiation states in accordance with a surface temperature distribution of the object during treatment of the object.
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