Apparatus for baking photoresist applied on substrate
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United States of America Patent
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-
Oct 6, 1998
Grant Date -
N/A
app pub date -
May 29, 1996
filing date -
May 30, 1995
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A photomask substrate, which is formed in a rectangular shape and on the surface of which photoresist is applied, is located above a lower heating plate so as to be separated from the lower heating plate by a proximity distance. The lower heating plate is provided with a heat unifying ring fixedly arranged thereon so as to surround the photomask substrate. The periphery of the heat unifying ring is provided with a taper section tapered at a predetermined angle to the periphery. The heat unifying ring has a container for containing the photomask substrate, at the central portion. An upper heating plate is arranged above the lower heating plate. The upper heating plate is provided with a baking chamber thereabove to cover the entire portion of the baking chamber section, thereby the baking chamber section can be shielded from the outside and free from the influence of the outside.
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