Film thickness measuring apparatus
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United States of America Patent
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Oct 6, 1998
Grant Date -
N/A
app pub date -
Sep 3, 1997
filing date -
Sep 6, 1996
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A sample is placed on a sample receiving stage for receiving the sample. The sample is transferred one at a time to a measuring table, and a thickness of a thin film formed on a surface of the sample is measured by irradiating the surface of the sample with a measuring light beam. A covering structure is disposed between the sample receiving stage and the measuring table to define a sample transfer space and a measuring space in which the measuring table is disposed. A high-purity purging gas containing only a very small amount of contaminants is supplied through purging gas supply devices into the transfer space and the measuring space covered with the covering structure.
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