Bright beam method for super-resolution in e-beam lithography
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United States of America Patent
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Oct 20, 1998
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N/A
app pub date -
Dec 23, 1996
filing date -
Dec 23, 1996
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Expired
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Abstract
A method and apparatus for bonding a layer of coating material onto a subate with minimal bulk heating of the substrate. A pulsed electron beam generator is used to produce high energy electrons at the beginning of the pulse and a larger number of lower energy electrons at the end of the pulse. A thin sacrificial or ablative layer of an easily-vaporized material such as tin is placed on top the coating. The high energy electrons penetrate through the ablative and coating layers. The ablative layer is heated to a molten state, causing it to vaporize. The ablation process generates a force on the coating layer which drives it into the substrate.
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