Removal of technetium impurities from uranium hexafluoride
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United States of America Patent
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Oct 20, 1998
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N/A
app pub date -
May 21, 1997
filing date -
May 21, 1997
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Abstract
Processes for the removal of technetium from contaminated uranium hexafluoride containing technetium, typically as technetium-99 (.sup.99 Tc) in nominal chemical forms are provided. The processes involve contacting the contaminated liquefied uranium hexafluoride with a metal fluoride, typically magnesium fluoride (MgF.sub.2), for a period of time sufficient for the technetium to become adsorbed onto the metal fluoride thereby producing a purified uranium hexafluoride liquid; and removing the purified uranium hexafluoride liquid from the metal fluoride having adsorbed technetium.
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