Chemical vapor deposition of tin oxide films
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United States of America Patent
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Nov 3, 1998
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N/A
app pub date -
Jun 30, 1997
filing date -
Oct 22, 1994
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Abstract
A method of depositing a tin oxide film onto a heated substrate is provided, by chemical vapor deposition using a tetraalkyoxy tin compound. Further provided is a method for doping the film with platinum or palladium using a .beta.-diketonate precursor thereof.
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