Magnetic deflectors and charged-particle-beam lithography systems incorporating same
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United States of America Patent
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-
Nov 3, 1998
Grant Date -
N/A
app pub date -
Feb 18, 1997
filing date -
Feb 19, 1996
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Magnetic deflectors for charged particle beams are provided. The magnetic deflectors comprise at least one pair of coils to provide high deflection sensitivity over large regions of uniform deflection without increasing the size of the magnetic core used by the deflectors. Charged-particle-beam lithography systems using such deflectors are also disclosed.
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