Transparent article having protective silicon nitride film
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United States of America Patent
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Nov 10, 1998
Issued Date -
N/A
app pub date -
Oct 19, 1995
filing date -
May 3, 1994
priority date (Note) -
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Abstract
Transparent articles comprising transparent, nonmetallic substrate and a transparent film stack is sputter deposited on the substrate. The film stack is characterized by including at least one infrared reflective metal film, a dielectric film over the metal film, and a protective silicon nitride film of 10 .ANG. to 150 .ANG. in thickness over the said dielectric film. The dielectric film desirably has substantially the same index of refraction as does silicon nitride and is contiguous with the silicon nitride film.
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