Method and apparatus for transfer of a reticle pattern onto a substrate by scanning

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United States of America Patent

PATENT NO 5835195
SERIAL NO

08212239

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Abstract

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A system and method for transferring a reticle (201) pattern to a substrate image (203) by scanning. The reticle is placed between an illumination system (118) and the projection lens (117). The substrate is located below the projection lens. A loading system, wafer adjustment system, and focusing system are also disclosed.

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Patent Owner(s)

Patent OwnerAddress
ULTRATECH INC3050 ZANKER ROAD SAN JOSE CA 95134

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gibson, John A Sunnyvale, CA 7 245
Knirck, Jeffrey G Sunnyvale, CA 15 286

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