Method and apparatus for transfer of a reticle pattern onto a substrate by scanning
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United States of America Patent
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Nov 10, 1998
Issued Date -
N/A
app pub date -
Mar 14, 1994
filing date -
Nov 4, 1991
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A system and method for transferring a reticle (201) pattern to a substrate image (203) by scanning. The reticle is placed between an illumination system (118) and the projection lens (117). The substrate is located below the projection lens. A loading system, wafer adjustment system, and focusing system are also disclosed.
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