Coating solution applying method and apparatus
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United States of America Patent
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-
Dec 1, 1998
Grant Date -
N/A
app pub date -
Jun 11, 1996
filing date -
Jun 15, 1995
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method of applying a coating solution to spinning substrates, in which a controller causes a rotary support to spin a substrate at low speed with a predetermined supplying rotational frequency. The coating solution is supplied through a coating solution supply nozzle to a region centrally of the substrate spinning at low speed. The rotational frequency of the substrate is increased to a target rotational frequency before the coating solution supplied to the substrate spreads over an entire surface of the substrate. Then, the controller causes the rotary support to spin the substrate at high speed with a predetermined film-forming rotational frequency, thereby coating the surface of the substrate with a film of desired thickness. Also, an apparatus for performing such method.
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