Projection exposure apparatus including a condenser optical system for imaging a secondary light source at positions different in an optical axis direction with respect to two crossing planes
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United States of America Patent
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Dec 8, 1998
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N/A
app pub date -
Jan 24, 1995
filing date -
Jan 26, 1994
priority date (Note) -
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Abstract
A projection exposure apparatus includes a projection optical system for projecting a pattern of a first object onto a second object; a laser source; an optical integrator for forming a secondary light source from the laser source; and a condenser optical system for imaging the secondary light source behind the first object at positions different in a direction of an optical axis with respect to two different directions to illuminate the first object therewith.
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