Method for manufacturing a chemically adsorbed film and a chemical adsorbent solution for the method
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United States of America Patent
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Dec 15, 1998
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N/A
app pub date -
Jun 11, 1996
filing date -
Jun 14, 1995
priority date (Note) -
Expired
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Abstract
The methods of forming a chemically adsorbed film by contacting a substrate with a solution mixture containing an alkoxysilane surface active agent, a non-aqueous solvent and a silanol-condensing catalyst to form a film covalently bonded to the substrate via siloxane bonds. These methods do not generate hydrochloric acid gas in forming the films and allow practical reaction rates.
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