Method of manufacturing electron-emitting device, electron source and image-forming apparatus

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United States of America Patent

PATENT NO 5853310
SERIAL NO

08563768

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Abstract

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A method of manufacturing an electron-emitting device includes providing a pair of electrodes and an electroconductive thin film arranged between the electrodes. The method also includes a step of forming an electron-emitting region in the electroconductive film by the steps of partially modifying the composition of the electroconductive thin film with a chemical change to make a region of the electroconductive thin film have a higher resistivity than a resistivity in other regions, and causing an electric current to run through the electroconductive thin film to form the electron-emitting region in the region having the higher resistivity.

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Patent Owner(s)

Patent OwnerAddress
CANON KABUSHIKI KAISHATOKYO JAPAN TOKYO METROPOLIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Banno, Yoshikazu Machida, JP 52 1232
Miyata, Hirokatsu Hadano, JP 73 575
Nishimura, Michiyo Sagamihara, JP 33 636
Nomura, Ichiro Atsugi, JP 103 2095
Takada, Kazuhiro Atsugi, JP 24 201
Tsukamoto, Takeo Atsugi, JP 217 3544

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