Method for selective deposition modeling
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 5, 1999
Issued Date -
N/A
app pub date -
Jun 12, 1997
filing date -
Sep 27, 1995
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A novel thermopolymer material adapted for use in thermal stereolithography. More particularly, a thermopolymer material comprising a mixture of: a low shrinkage polymer resin; a low viscosity material such as paraffin wax; at least one microcrystalline wax; a toughening polymer, a plasticizer. Alternative embodiments further include components to improve the materials ability to transfer heat and to improve strength. The subject material, together with the described process greatly reduce part building distortions while retaining desirable toughness, strength and jetting properties.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully