Method for cleaning substrates
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United States of America Patent
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-
Jan 12, 1999
Issued Date -
N/A
app pub date -
Mar 17, 1997
filing date -
Jan 19, 1995
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A substrate cleaning method in which the substrate is rotated and cleaned utilizing a brush which is brought into contact with the substrate. In accordance with one presently preferred aspect, the substrate is held between a stepped portion and a stopper portion at the fringe of the substrate, thereby preventing movement of the substrate as it is rotated and the brush is brought into contact with the substrate. In accordance with another aspect, a freely rotatable brush is brought into contact with the substrate so that the brush can rotate with the rotating substrate, and damage to the substrate can be minimized.
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International Classification(s)
Cited Art Landscape
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