Plasma processing apparatus and method
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United States of America Patent
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Jan 12, 1999
Issued Date -
N/A
app pub date -
Jul 14, 1997
filing date -
Apr 27, 1987
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A plasma processing apparatus and method is equipped with a vacuum chamber, helmholtz coils, a microwave generator and gas feeding systems. An auxiliary magnet is further provided in order to strengthen the magnetic field in the vacuum chamber to produce centrifugal drifting force which confine the plasma gas about the center position of the vacuum chamber.
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