Method and apparatus for macro defect detection using scattered light
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United States of America Patent
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Jan 12, 1999
Grant Date -
N/A
app pub date -
May 7, 1997
filing date -
May 7, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Macro defects in a processed or partly processed semiconductor wafer, liquid crystal display element, disk drive element or the like, are detected using scattered light. By use of automated image processing techniques, a reference image and a sample image are formed from the scattered light and edge enhanced. A difference image is formed by comparing the edge enhanced reference and sample images. The difference image is evaluated using one or more automated image processing techniques such as thresholding, morphological transformations and blob analysis to identify macro defects.
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