Resist processing method and resist processing system

United States of America Patent

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Feb 2, 1999
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Sep 11, 1997
filing date
Sep 13, 1996

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Abstract

A resist processing method for introducing a pressurized gas into a vessel storing a solution, sending the solution from the vessel to a nozzle by way of a supply line by means of the pressurized gas, and supplying the solution from the nozzle to a substrate.

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Patent Owner(s)

Patent Owner	Address
TOKYO ELECTRON LIMITED	3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

International Classification(s)

G03C:PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Hasebe, Keizo	Kofu, JP	11	951
Kiba, Yukio	Kumamoto-ken, JP	5	114
Semba, Norio	Kumamoto, JP	15	766

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Resist processing method and resist processing system

Number of patents in Portfolio can not be more than 2000

United States of America Patent

08927418

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PATENT NO	5866307
SERIAL NO	08927418
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08927418

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