Method for removing inorganic contamination by chemical derivitization and extraction
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United States of America Patent
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Feb 9, 1999
Grant Date -
N/A
app pub date -
Jul 23, 1997
filing date -
Jul 25, 1996
priority date (Note) -
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Abstract
A method of removing inorganic contamination from substantially the surface of a semiconductor substrate, the method comprising the steps of: reacting the inorganic contamination with at least one conversion agent, thereby converting the inorganic contamination; removing the converted inorganic contamination by subjecting it to at least one solvent agent, the solvent agent is included in a first supercritical fluid (preferably supercritical CO.sub.2); and wherein the converted inorganic contamination is more highly soluble in the solvent agent than the inorganic contamination.
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