Method of and apparatus for cleaning workpiece
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United States of America Patent
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Feb 9, 1999
Grant Date -
N/A
app pub date -
Mar 1, 1996
filing date -
Mar 3, 1995
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method of and an apparatus for cleaning a thin disk-shaped workpiece that is required to have a high degree of cleanliness, e.g., a semiconductor wafer, a glass substrate, a liquid crystal display, or the like. The method of cleaning the workpiece includes a plurality of cleaning steps, and comprises the steps of holding a workpiece, and performing a liquid jet cleaning of a surface of the workpiece in a first portion of plural cleaning steps. The method further comprises the step of performing a liquid jet cleaning of the surface of the workpiece in a latter portion of the plural cleaning steps.
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