Method to correct astigmatism of fourth yag to enable formation of sub 25 micron micro-vias using masking techniques
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United States of America Patent
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Feb 9, 1999
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N/A
app pub date -
Nov 8, 1996
filing date -
Nov 8, 1996
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Abstract
A method of forming a via in a laminated substrate by placing a first mask between an output optics of a laser and an exposed surface of a laminated substrate. The first mask has a first aperture corresponding to a location of a via in the substrate. A second mask is placed between the first mask and the output optics of the laser. The second mask has a second aperture disposed within a main beam of a laser beam output from the laser and blocks side lobes of the laser beam from reaching the exposed surface of the substrate.
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