Computer controlled vapor deposition processes
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United States of America Patent
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Feb 16, 1999
Grant Date -
N/A
app pub date -
Apr 8, 1996
filing date -
Apr 8, 1996
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for computerized control of vapor deposition processes, including chemical vapor deposition and electron beam physical vapor deposition processes, uses optical imaging sensors and/or laser interferometers or infrared ellipsometers focused on the substrate being coated or on a nearby test blank to provide information which is computer analyzed to yield optimum control points for the coating process. A method is also disclosed for shaping or contouring one or more surfaces of an object(s) using the techniques disclosed here.
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