A.C. plasma processing system
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United States of America Patent
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Mar 16, 1999
Grant Date -
N/A
app pub date -
Jun 21, 1996
filing date -
Jun 21, 1996
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An AC plasma processing system according to the present invention may include a transformer for placing an alternating current on a first electrode and a second electrode contained within a process chamber. The secondary winding of the transformer is connected across the first and second electrodes. The primary winding of the transformer is connected to an external power supply. A switching device connected to the primary winding of the transformer periodically short circuits the primary winding to induce a secondary voltage in the secondary winding that is less than the arcing voltage associated with the process chamber.
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