Methods and apparatus for detecting and compensating for focus errors in a photolithography tool

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5883703
SERIAL NO

08600592

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

An apparatus for detecting and compensating for focus errors in a photolithography tool which holds a reticle and a substrate substantially parallel is described. The apparatus includes at least one proximity gauge for determining a first distance between the reticle and the substrate, thereby determining if a focus error condition exists. The apparatus also includes an actuator for adjusting the position of the reticle with respect to the substrate, thereby compensating for the focus error condition. According to another embodiment, a lens system actuator is employed for adjusting a lens system parameter, thereby compensating for the focus error condition detected by the at least one proximity gauge.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
MEGAPANEL CORPORATIONSTE 2200 4100 WEST FLAMINGO ROAD LAS VEGAS NV 89103

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gibson, John A Sunnyvale, CA 7 245
Knirck, Jeffrey G Sunnyvale, CA 15 286
Swanson, Paul A San Jose, CA 9 197

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation