Method of fabricating shaped crystals by overhead-pressure liquid injection
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United States of America Patent
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Mar 23, 1999
Grant Date -
N/A
app pub date -
May 21, 1997
filing date -
Sep 29, 1995
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A shaper (2) is arranged within a shaping vessel (1). A raw material for a crystal is inserted into the shaping vessel (1) and a crystal melt (5) is formed by setting it in a predetermined atmosphere and heating it. A mechanical force F1 is applied to the crystal melt (5), which is present on the upper surface of the shaper (2), by a pressuring member (4) from above. The crystal melt (5) has nowhere to escape but a gap (3) formed by the shaper(2), so it is injected into that gap (3) as shown by the arrow. This method of fabricating a shaped crystal is suitable for fabricating a monocrystal or multicrystal semiconductor from a material such as silicon, germanium, or bismuth telluride.
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