Process for removing residue from screening masks with alkaline solution
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United States of America Patent
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Mar 30, 1999
Grant Date -
N/A
app pub date -
Feb 28, 1997
filing date -
Feb 28, 1997
priority date (Note) -
Expired
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Abstract
This invention relates to the use of water-based cleaning solutions and their use as environmentally safe replacements of chlorinated hydrocarbon solvents to remove metal-polymer composite paste residue from screening masks and ancillary equipment, such as, used for screening a conductive metal pattern on a ceramic green sheet in the manufacture of multi-layer ceramic products.
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