Processes for the chemical vapor deposition and solvent used for the processes
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 4, 1999
Issued Date -
N/A
app pub date -
Apr 18, 1997
filing date -
Nov 20, 1995
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The present invention offers processes for CVD (chemical vapor deposition) that enables one to use a new metallic organic compound as a raw material resource. The present invention involves the steps of: adding a metallic organic compound having a group capable of becoming free to a liquid of a compound having the same group as the group capable of becoming free of the metallic organic compound to prepare a solution; vaporizing the solution; decomposing the metallic organic compound; and depositing a metallic film on a substrate.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully