Maskless lithography using a multiplexed array of fresnel zone plates
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United States of America Patent
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May 4, 1999
Grant Date -
N/A
app pub date -
May 30, 1997
filing date -
May 30, 1997
priority date (Note) -
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Abstract
An array of Fresnel zone plates is illuminated by parallel beamlets of narrow-band electromagnetic radiation. The individual zone plates focus a significant fraction of the incident radiation to foci on a substrate located at least several micrometers distant. The beamlets are capable of being individually turned on or off by shutters, or by deflecting small mirrors that would otherwise direct a beamlet to its Fresnel zone plate. Pattern generation is accomplished by moving the substrate while multiplexing the individual beamlets on or off.
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