High speed pattern inspection method and system

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United States of America Patent

PATENT NO 5900941
SERIAL NO

08864964

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Abstract

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A pattern inspection method includes the steps of: copying design data representative of a design pattern in a storage unit; generating index data and storing the index data in the storage unit, the index data indicating data at what position of the design pattern is stored at which location of the storage unit; picking up an image of a real pattern on a stage and generating real pattern data; reading the design data by using the index data in accordance with a position on the real pattern; generating design pattern data in accordance with the read design data; and comparing the real pattern data with the design pattern data to detect any defect in the real pattern data. A pattern inspection method and system is provided which can perform die-to-database inspection at high speed.

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Patent Owner(s)

Patent OwnerAddress
FUJITSU LIMITEDKAWASAKI-SHI KANAGAWA 211-8588
LASERTEC CORPORATION2-10-1 SHIN-YOKOHAMA KOHOKU-KU YOKOHAMA KANAGAWA 222-8552

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hada, Yasunori Yokohama, JP 3 27
Kobayashi, Ken-ichi Kawasaki, JP 9 52
Matsuyama, Takayoshi Kawasaki, JP 9 83
Nakashima, Katsuyoshi Yokohama, JP 2 12

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