Polishing machine with efficient polishing and dressing
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United States of America Patent
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-
May 11, 1999
Grant Date -
N/A
app pub date -
Mar 18, 1997
filing date -
Mar 19, 1996
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A dresser for dressing a polishing cloth adhered to a platen is provided with different dressing tools such as a lapping tool and a brush disposed around the lapping tool. In polishing, the platen is rotated and a wafer holding unit sucks and holds a wafer to press it against the polishing cloth while the wafer is rotated. In this manner, while polishing is performed, dressing is performed at the same time by pressing the dressing tools of the dresser against the polishing cloth. The brush and lapping tool may be rotated independently, or the dresser may be swung while it is rotated.
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Family
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Cited Art Landscape
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