Apparatus for and method of treating substrate
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United States of America Patent
Stats
-
May 18, 1999
Grant Date -
N/A
app pub date -
Sep 11, 1996
filing date -
Sep 27, 1995
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus for treating a substrate with a predetermined treatment liquid includes: a first storing portion for storing the treatment liquid; a supplying device for supplying the treatment liquid stored by the first storing device to the substrate located at a predetermined position; a receiving portion for receiving the treatment liquid supplied to the substrate after applied to the substrate; a second storing portion for storing the treatment liquid received by the receiving device; an introducing system for introducing the treatment liquid stored by the second storing portion to the first storing portion; and a controlling device for controlling the introducing system so as to prevent bubbles included in the treatment liquid stored by the second storing portion from introduction to the first storing portion.
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