Dibasic ester stripping composition
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United States of America Patent
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Jun 8, 1999
Issued Date -
N/A
app pub date -
Apr 20, 1998
filing date -
Jan 30, 1996
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A mixture of a dibasic ester (DBE), an alcohol, and water to remove photoresist from a silicon wafer substrate. Photoresist is effectively removed at ambient temperature with this non-phenolic, non-halogenated stripper solution. Dissolved photoresist is easily separated from the water mixture for disposal.
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