Method and apparatus for processing photosensitive materials

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United States of America Patent

PATENT NO 5911091
SERIAL NO

08557567

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Abstract

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A method for processing photosensitive materials in which photosensitive materials are conveyed along a serial conveyance passage while guiding the photosensitive materials on both sides thereof by using pairs of guide members to successively perform development processing steps comprises the steps of dividing the conveyance passage into a plurality of blocks, a spacing distance between the pair of guide members on the conveyance passage being changeable in each of the divided blocks, and changing the spacing distance between the pair of guide members in each of the blocks, when a photosensitive material having a different widthwise dimension is introduced into the conveyance passage, in accordance with the widthwise dimension of the photosensitive material before introducing a forward end of the photosensitive material having the different widthwise dimension into each of the blocks. Therefore, when photosensitive materials having different widthwise dimensions are alternately processed, it is possible to start processing for a following photosensitive material during a period in which a preceding photosensitive material is processed on the conveyance passage.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATIONTOKYO 106-8620

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Matsumoto, Nobuo Kanagawa, JP 69 852
Tanaka, Tadashi Kanagawa, JP 117 1304

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