Stereolithography layering control system
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United States of America Patent
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Jul 13, 1999
Grant Date -
N/A
app pub date -
Mar 3, 1997
filing date -
Mar 3, 1997
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus and method for depositing a layer of liquid medium along an upper surface of a liquid medium bath. A first reserve supply volume projecting upwardly from said surface and a continuous sheet of discharged liquid medium are provided above a working zone along said surface. The discharged liquid medium sheet is substantially uniformly deposited to produce a continuous supply of liquid medium and to add liquid medium to the first reserve supply volume as the continuous sheet moves along the upper bath surface. A liquid medium layer having a preselected thickness is formed with liquid medium flowing from said first reserve supply volume of liquid medium. An applicator assembly includes an applicator device and a pumping assembly to produce the reserve supply volume from a liquid medium bath.
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