Substrate holding system and exposure apparatus using the same

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United States of America Patent

PATENT NO 5923408
SERIAL NO

08788828

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Abstract

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A substrate holding system for holding a substrate by attraction through a negative pressure, has protrusions for supporting the substrate, including a primary protrusion of annular shape disposed around a substrate lifting pin and secondary protrusions distributed around the primary protrusions, and an arrangement for reducing a local change in shape of the substrate in a portion around the primary protrusion as the substrate is attracted by the negative pressure.

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Patent Owner(s)

Patent OwnerAddress
CANON KABUSHIKI KAISHAJAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Takabayashi, Yukio Utsunomiya, JP 31 640

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