US Patent No: 5,926,257

Number of patents in Portfolio can not be more than 2000

Illumination optical system and exposure apparatus having the same

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Importance

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Abstract

An illumination optical system includes a first diffraction optical element, a second diffraction optical element and a condenser lens. The first diffraction optical element has a plurality of micro diffraction optical elements, which have a first optical power in a first direction and an optical power different from the first optical power in a second direction, perpendicular to the first direction. The second diffraction optical element has a plurality of micro diffraction optical elements, which have a second optical power in the second direction and an optical power different from the second optical power in the first direction. The first optical power is different from the second optical power. Light supplied from a light source forms a plurality of secondary light sources by passing through the first and second diffraction optical elements. Light from the secondary light sources passing through the condenser lens generates Kohler illumination on a surface to be irradiated.

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First Claim

Related Publications

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Patent Owner(s)

Patent OwnerAddressTotal Patents
CANON KABUSHIKI KAISHATOKYO49710

International Classification(s)

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  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mizouchi, Satoru Utsunomiya, JP 15 161

Cited Art

Patent Info (Count) # Cites Year
 
CANON KABUSHIKI KAISHA (13)
4,617,469 Exposure apparatus with detecting means insertable into an exposure path 15 1983
4,659,225 Pattern exposure apparatus with distance measuring system 32 1985
4,682,885 Illumination apparatus 54 1986
4,851,882 Illumination optical system 48 1988
4,874,954 Projection exposure apparatus 31 1989
4,974,919 Illuminating device 111 1989
5,153,773 Illumination device including amplitude-division and beam movements 99 1990
5,263,250 Method of manufacturing nozzle plate for ink jet printer 54 1991
5,091,744 Illumination optical system 42 1991
5,121,160 Exposure method and apparatus 59 1991
5,828,496 Illumination optical system 5 1994
5,719,617 Illumination system for superposing light beams one upon another on a surface using a projecting system having different focal point positions 12 1995
5,699,148 Exposure apparatus and microdevice manufacturing method using the same 13 1996
 
NIKON CORPORATION (7)
4,939,630 Illumination optical apparatus 85 1988
5,097,291 Energy amount control device 140 1991
5,245,384 Illuminating optical apparatus and exposure apparatus having the same 82 1992
5,335,044 Projection type exposure apparatus and method of exposure 40 1993
5,798,824 Exposure apparatus correcting illuminance distribution 10 1995
5,745,294 Illuminating optical apparatus 18 1996
5,815,248 Illumination optical apparatus and method having a wavefront splitter and an optical integrator 20 1997
 
OLYMPUS OPTICAL CO., LTD. (1)
5,695,274 Illuminating optical system for use in projecting exposure device 6 1995

Patent Citation Ranking

Forward Cites

Patent Info (Count) # Cites Year
 
ASML NETHERLANDS B.V. (5)
6,466,304 Illumination device for projection system and method for fabricating 20 1999
7,092,073 Method of illuminating a photomask using chevron illumination 0 2001
6,791,667 Illumination device for projection system and method for fabricating 1 2002
6,788,388 Illumination device for projection system and method for fabricating 3 2002
RE40239 Illumination device for projection system and method for fabricating 1 2004
 
CARL ZEISS SMT GMBH (5)
7,551,261 Illumination system for a microlithography projection exposure installation 1 2005
7,508,488 Projection exposure system and method of manufacturing a miniaturized device 1 2005
7,995,280 Projection exposure system, beam delivery system and method of generating a beam of light 0 2005
7,508,489 Method of manufacturing a miniaturized device 0 2005
7,230,220 Method of determining optical properties and projection exposure system comprising a wavefront detection system 0 2006
 
CANON KABUSHIKI KAISHA (4)
6,285,440 Illumination system and projection exposure apparatus using the same 19 1998
6,665,052 Illumination optical system and projection exposure apparatus 4 1999
6,285,442 Exposure apparatus and device manufacturing method using the exposure apparatus 10 1999
6,307,618 Projection exposure apparatus and device manufacturing method including a projection optical system having a pair of diffractive members 7 1999
 
ASML HOLDING N.V. (1)
7,006,198 System and method for laser beam expansion 0 2004
 
CARL ZEISS SMT AG (1)
6,583,937 Illuminating system of a microlithographic projection exposure arrangement 30 2001
 
MINOLTA CO., LTD. (1)
6,643,300 Laser irradiation optical system 2 2000
 
NIKON CORPORATION (1)
6,913,373 Optical illumination device, exposure device and exposure method 15 2003
 
NIKON PRECISION INC. (1)
RE41681 Enhanced illuminator for use in photolithographic systems 0 2006