Cleaning apparatus
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United States of America Patent
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-
Jul 27, 1999
Grant Date -
N/A
app pub date -
Feb 19, 1997
filing date -
Feb 20, 1996
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A cleaning apparatus is disclosed which is capable of simultaneously and precisely cleaning two sides of a substrate required to be cleaned, such as a silicon wafer. The cleaning apparatus has a holding unit for horizontally holding a substrate required to be cleaned, a rotating unit for rotating the holding unit, a first cleaning-fluid injection unit disposed above the holding unit and arranged to inject cleaning fluid with high-frequency acoustic waves to the surface of the substrate supported by the holding unit and a second cleaning-fluid injection unit disposed below the holding unit and arranged to inject cleaning fluid to the reverse side of the substrate supported by the holding unit.
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