Method for manufacturing thin film
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United States of America Patent
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Jul 27, 1999
Grant Date -
N/A
app pub date -
Jan 13, 1997
filing date -
Jan 17, 1996
priority date (Note) -
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Abstract
A method of manufacturing thin films by plasma CVD is described. This method comprises supplying power to a power electrode in a way such that a self-bias upon plasma discharge of the power applying electrode, which is situated in a plasma discharge space, is a positive potential relative to a ground electrode.
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