Aqueous cleaning composition for removing flux and method of use
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United States of America Patent
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Aug 3, 1999
Grant Date -
N/A
app pub date -
May 20, 1997
filing date -
Jun 26, 1996
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A flux-removing, aqueous cleaning composition contains: (A) a solvent phase consisting essentially of water; and (B) a flux-removing phase containing an alkaline salt component and a surfactant formulation, the alkaline salt component containing at least one alkali metal salt, and the surfactant formulation containing at least one fluorinated, nonionic surfactant. A method of removing rosin flux residues from a substrate, preferably a substrate of an electronic circuit assembly, involves (a) cleaning the substrate with the above-described aqueous cleaning composition for a period of time sufficient to substantially emulsify the soldering rosin flux residues to form emulsified rosin flux residues; and (b) removing the emulsified rosin flux residues from the substrate.
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