Exact transmission balanced alternating phase-shifting mask for photolithography
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United States of America Patent
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Aug 3, 1999
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N/A
app pub date -
Feb 24, 1998
filing date -
Feb 24, 1998
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Abstract
A two-step method for eliminating transmission errors in alternating phase-shifting masks is described. Initially, the design data is selectively biased to provide a coarse reduction in the inherent transmission error between features of different phase, size, shape, and/or location. During fabrication of the mask with the modified data, residual transmission errors are then eliminated via the positioning of the edges of the etched-quartz trenches which define the phase of a given feature to a set location beneath the opaque chrome film. Application of feedback, in which the aerial image of the mask is monitored during the positioning of the etched-quartz edges, provides additional and precise control of the residual transmission error.
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