Method of processing resist utilizing alkaline component monitoring

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5932380
SERIAL NO

08823470

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold value.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 107-6325

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kakazu, Yuji Ageo, JP 5 77
Kanzawa, Keiko Yamanashi-ken, JP 4 75
Katano, Takayuki Nirasaki, JP 13 308
Kawakami, Yasunori Kikuchi, JP 32 599
Park, Jae Hoon Misato, JP 62 247
Toshima, Takayuki Yamanashi-ken, JP 89 985
Yaegashi, Hidetami Kokubunji, JP 54 1908

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation