Photo-curable resin composition and process for preparing resin-basedmold

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5932625
SERIAL NO

08865676

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A photo-curable resin composition suitable as a material for photo-fabricating and capable of producing cured products with excellent mechanical strength and high heat resistance. Further disclosed is a process for molding a resin-based mold which provides superior molding dimensional precision and superb repetition durability. The resin composition contains a monomer component containing (A) 30-70 wt % of a polyfunctional unsaturated monomer having a cyclic structure and (B) 70-30 wt % of a monofunctional unsaturated monomer having a cyclic structure of which the homopolymer has a glass transition temperature (Tg) of 70.degree. C. or higher; (C) a photo-initiator; and (D) an inorganic filler having an average particle diameter or an average fiber length of 1-50 .mu.m, wherein the ratio of the inorganic filler to 100 parts by volume of the monomer components and the photo-initiator is 100-160 parts by volume, and the heat distortion temperature of the cured resin produced from the photo-curable resin composition is 100.degree. C. or higher.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
DSM IP ASSETS B VMAASTRIK NETHERLANDS MAASTRICHT LIMBURG

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Haruta, Yuichi Ibaraki, JP 10 116
Matsumura, Ayao Mie, JP 3 42
Ukachi, Takashi Ibaraki, JP 71 1047
Watanabe, Tsuyoshi Ibaraki, JP 251 3095

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation