Semiconductor integrated circuit device and low breakdown voltage zener diode

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United States of America Patent

PATENT NO 5936288
SERIAL NO

08987377

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Abstract

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Anode and cathode regions at a principal surface of a semiconductor substrate have the same characteristics as source and drain regions of a P type MOS transistor. A cathode region is superposed partially on the anode region at the principal surface of the semiconductor substrate, the cathode region having the same characteristics as source and drain regions of an N type MOS transistor. The cathode and anode regions form a Zener diode. The Zener diode may be short-circuited by a large current flow, i.e., zapping, or used as a voltage regulator.

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Patent Owner(s)

Patent OwnerAddress
RENESAS ELECTRONICS CORPORATIONTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kadono, Satoshi Tokyo, JP 1 4
Kashimoto, Kouji Tokyo, JP 1 4
Tsuchida, Kazuhito Tokyo, JP 15 139

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