Micromechanical device with reduced load relaxation
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United States of America Patent
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Aug 24, 1999
Grant Date -
N/A
app pub date -
Dec 20, 1996
filing date -
Dec 22, 1995
priority date (Note) -
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Abstract
An improved elastic member (24) for micromechanical devices (12). The micromechanical device (12) includes a stationary member (28) and a moving member (26) which are connected together by a elastic member (24). Because of repeated and frequent movement of the moving member (26), the elastic member (24) can become permanently flexed or deformed, resulting in poor operation of the device. Aluminum alloys are formed to include oxygen, in combination with nitrogen if desired, to obtain a film with dramatically reduced load relaxation characteristics. Oxygen is added to an Argon sputter gas during deposition, and an amorphous film is produced.
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