US Patent No: 5,942,054
Number of patents in Portfolio can not be more than 2000
Micromechanical device with reduced load relaxation
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Aug 24, 1999
Issued date -
Dec 20, 1996
filing date -
08/772,588
serial no -
In Force
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Abstract
An improved elastic member (24) for micromechanical devices (12). The micromechanical device (12) includes a stationary member (28) and a moving member (26) which are connected together by a elastic member (24). Because of repeated and frequent movement of the moving member (26), the elastic member (24) can become permanently flexed or deformed, resulting in poor operation of the device. Aluminum alloys are formed to include oxygen, in combination with nitrogen if desired, to obtain a film with dramatically reduced load relaxation characteristics. Oxygen is added to an Argon sputter gas during deposition, and an amorphous film is produced.
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First Claim
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International Classification(s)
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Cited Art
| Patent Info | (Count) | # Cites | Year |
|---|---|---|---|
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| 5,061,049 Spatial light modulator and method | 703 | 1990 | |
| 5,552,924 Micromechanical device having an improved beam | 237 | 1994 | |
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| 5,413,974 Aluminum-containing oxide and process for producing aluminum-containing oxide | 32 | 1991 | |
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| 4,837,094 Oxygen-containing ferromagnetic amorphous alloy and method of preparing the same | 16 | 1987 | |