US Patent No: 5,942,672

Number of patents in Portfolio can not be more than 2000

Automated particle monitor operation for a thin film process

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ATTORNEY / AGENT: (SPONSORED)
 

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Abstract

A method of calibrating a particle monitor prior to applying DC power to a cathode in the processing chamber by first, initiating a flow of gas to the processing chamber. Next, the operation of the particle monitor is initiated to obtain a particle count within the flow of gas in the processing chamber. If the particle monitor detects a particle count in excess of a minimum value, the operation of the particle monitor is adjusted to reduce the particle count to the minimum value. During production, the particle monitor count is initiated by a particle monitor control only after the particle monitor control detects an occurrence of both a first signal generated in response to initiating a flow of gas to the processing chamber and, a second signal generated in response to the application of power to a cathode within the processing chamber.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
SONY CORPORATIONTOKYO, JP36236
SONY ELECTRONICS INC.PARK RIDGE, NJ2743

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Harwell, Cheryl Diane Atascosa, TX 2 4
Rayniak, Ray Rudi San Antonio, TX 2 4

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Patent Citation Ranking

Forward Cites

Patent Info (Count) # Cites Year
 
ADVANCED MICRO DEVICES, INC. (1)
7,145,653 In situ particle monitoring for defect reduction 3 2000
 
RENESAS ELECTRONICS CORPORATION (1)
6,650,409 Semiconductor device producing method, system for carrying out the same and semiconductor work processing apparatus included in the same system 11 1996