Micromachined devices having microbridge structure
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United States of America Patent
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Aug 24, 1999
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N/A
app pub date -
Mar 4, 1997
filing date -
Mar 6, 1996
priority date (Note) -
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Abstract
A method of fabricating a microbridge structure for a thermal detector array comprises growing a planarising layer on a substrate, growing a ferroelectric material layer on the planarising layer and then etching the planarising layer away, either wholly or partially, to leave a ferroelectric microbridge having a uniform thickness. The planarising layer may be a sacrificial layer or may comprise a sacrificial layer as well as other layers.
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