Apparatus and method for supplying process solution to surface of substrate to be processed
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United States of America Patent
Stats
-
Aug 31, 1999
Grant Date -
N/A
app pub date -
Dec 18, 1997
filing date -
Dec 27, 1996
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Disclosed is a processing apparatus comprising holding means, support means, process solution supply means, life means, and rotating means. A substrate to be processed is rotatably held by the holding means. An overhanging portion of the substrate extending over an edge of the holding means is supported by the support means to maintain a front surface of the substrate horizontally flat. A process solution is supplied from the process solution supply means onto the front surface of the substrate held by the holding means and supported by the support means. The substrate held by the holding means is vertically moved by the lift means relative to the support means. Further, the substrate moved upward relative to the support means is rotated by the rotating means.
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