Apparatus for preventing particle deposition in a capacitance diaphragm gauge
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United States of America Patent
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Sep 7, 1999
Grant Date -
N/A
app pub date -
Mar 11, 1998
filing date -
Mar 11, 1998
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Apparatus for reducing a material deposition in a housing is disclosed herein. The apparatus includes: a first pressure sensing device which senses a pressure in a reaction chamber, a pumping device for pumping the vapor from the reaction chamber to the pumping device, a valve that is opened when the pressure is larger than a first value and smaller than a second value, a bypass valve which is closed when the pressure is larger than the third value and smaller than the fourth value, a check valve that blocks a gas flow from the check valve to the bypass valve, and a pipe for connecting all of the above.
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