Vacuum processing apparatus
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United States of America Patent
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Sep 14, 1999
Issued Date -
N/A
app pub date -
Feb 21, 1997
filing date -
Aug 25, 1993
priority date (Note) -
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Abstract
A vacuum processing apparatus includes: a vacuum processing chamber for processing a target object; a processing gas supply source for supplying a processing gas by which a process is performed to the target object in the vacuum processing chamber; a processing gas supply pipe for supplying the processing gas from the processing gas supply source into the vacuum processing chamber; and a pressure reducing valve for keeping the gas supply pipe at a lower pressure than the atmospheric pressure when the processing gas is to be supplied to the vacuum processing chamber.
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